laser drilling

Automated, ultra-fast laser-drilling of nanometer scale pores and nanopore arrays in aqueous solutions

In our recent publication (Advanced Functional Materials ) we show that low-intensity laser etching and nanopore formation in amorphous silicon-nitride (SixN) freestanding films highly depends on the Si to N ratio. Increasing the relative Si content yields orders of magnitude increase in etch rate, which is further accelerated in alkaline environments, enabling the fabrication of nanopore arrays within tens of seconds at any arbitrary location.